Hardware

New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes — questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing

New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes — questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing

💡 Verdict: Dai Nippon Printing (DNP) has announced a 1.4nm nanoimprint lithography template, potentially reducing reliance on EUV in advanced process nodes, although foundry adoption remains uncertain. Check Price: 1.4nm Template ⚡ Quick Hits * DNP's template aims for mass production by 2027. * The technology could decrease the need
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