New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes ā questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing
ā” Quick Hits
- DNP's template aims for mass production by 2027.
- The technology could decrease the need for expensive EUV lithography.
- No foundries have committed to using nanoimprint lithography for high-volume manufacturing yet.
Dai Nippon Printing (DNP) from Japan has announced the development of a nanoimprint lithography template that they claim is capable of patterning logic down to a 1.4nm feature size. The company plans to begin mass production of these templates in 2027.
This development is significant because nanoimprint lithography offers a potential alternative to extreme ultraviolet (EUV) lithography, which is currently used for creating the most advanced chips. EUV is notoriously expensive and complex, so a viable alternative could reduce manufacturing costs and increase production capacity.
However, the announcement also raises questions. While the technology sounds promising, no major foundry has yet committed to using nanoimprint lithography for high-volume manufacturing. The industry will be watching closely to see if DNP can secure partnerships and demonstrate the reliability and scalability of their new template.
